The Harrier-M™ is a mini batch ALD system for NAND, DRAM and Logic device which has better ALD performance with small volume, narrow gap & wide boat pitch. The better ALD performance with faster pumping/purge ability can provide increased film quality with precision material engineering, excellent step coverage, minimal pattern loading, lower impurity and best wafer to wafer uniformity with compact “5+1” zone heater.

• Temperature Range: 400~850°C
• Dual Tube (Inner & Outer Tube)
• Smaller Volume & Higher Vacuum Conductance
• Direct Laminar Flow with Narrow Gap & Wide Boat Pitch
• Compact “5+1” Zone Heater Design
• Chamber In-situ Cleaning

• Precision Material Engineering with Better ALD Performance
• Excellent Step Coverage
• Excellent Within Wafer and Wafer to Wafer Uniformity
• Minimal Pattern Loading Effect
• Lower Film Impurity
• Well-proven Safety for High Temperature Process
• High Throughput with Improved UPS