> PRODUCT > Plasma Enhanced ALD
The Harrier-L™ is Eugene’s new product for batch Thermal & Plasma Enhanced ALD and LPCVD process, provides outstanding mass productivity as compared with established batch system and excellent process solutions with high vacuum conductance design and high thermal control accuracy.
- Large Batch Process Chamber
- State-of-the-art Heater Element Technology
- Enhanced Vacuum Conductance for Fast Gas Flow Speed
- High Speed Wafer Transfer Robot
- High Throughput (Up to 150 Wafers/Batch)
- Excellent WiW and WtW Thickness Uniformity
- Excellent Temp. Stability by using Unique 7+1 Zone Heater
- Lower Particle Generation with In-situ Cleaning
- Low Loading Effect
| LSI | NAND | DRAM |
|---|---|---|
| - Space ALDSIN |
- Space ALDSIN - Passivation ALDSIN |
- Capping ALDSIN - Passivation ALDSIN - Buffer ALDSIN - Stopper ALDSIN - Spacer ALDSIN - Liner ALDSIN - Passivation ALDSIN |
